ASM 外延EPI 2000PLUS 介绍.pptVIP

Epsilons Competitive Advantage Epitaxial Product Line Epsilon Market Distribution Epsilon? 3200 Overview Epsilon? 3200 System Layout Epitaxy Process and Equipment Technology Roadmap Unique Competitive AdvantagesProcess Chamber Design Unique Competitive AdvantagesTemperature Measurement Unique Competitive Advantages  Epsilon? 3200 Dual 25 Wafer LL Unique Competitive Advantages Silcore Unique Competitive Advantages  E3 Solution? Enhanced Epi Emitter (E3 Solution?) Native Oxide Removal for Low Thermal Budget Applications Benchmark Summary for Single Wafer Epi * Confidential and Proprietary Information ? 2005 ASM Front-End Operations ASM logo must not be moved or changed and should always be placed at this position Front-End Operations, should not be moved or changed. Arial Regular, 7pt white Title: Arial Bold, 26pt, white Maximun lenght 2 lines. If subtitle: Arial, Regular, 19pt, yellow Red:249/Green:220/Blue:125 Body text: Arial Regular 26 pt, black Release date: May 2004 For the latest update, go to:…….. Optional slide number: 8pt Arial Bold, white Title/subtitle/confidentiality line: 8pt Arial Regular, whiteMaximum length: 1 line Copyright: 8pt ArialRegular, white For questions, please contact: Central Marketing Version January 2005 Client presentations: client’s logo may go in this area Presentation title:32pt Arial Regular, white Confidentiality line: 8pt Arial Regular, whiteMaximum length: 1 line Release date: May 2004 For the latest update, go to:…….. For questions, please contact: Central Marketing Copyright: 8pt ArialRegular, white Presentation subtitle:24pt Arial Regular, white Date: 20pt ArialRegular, white Confidential and Proprietary Information Atmospheric and Reduced Pressure Compatible The Epsilon? 2000 Worlds first production single wafer Epi Reactor The Epsilon? 3200 Worlds first 300 mm dual 25 wafer load lock Epi Reactor Installed Base: 62 (Q1-05) 300 mm System Installed Base: 537 (Q1-05) 75 - 200 mm System Atmospher