基于硫醇-烯的微光学元件低收缩紫外压印工艺.docVIP

 基于硫醇-烯的微光学元件低收缩紫外压印 工艺# 刘楠，金鹏，谭久彬** 5 10 15 20 25 30 35 （哈尔滨工业大学电气工程及自动化学院，哈尔滨 150001） 摘要：应用紫外纳米压印技术结合反应离子刻蚀技术制作石英玻璃基底上微结构光学元件是 一种低成本、高效率、高分辨力的加工方法。光刻胶的固化收缩是紫外压印工艺面临的主要 问题之一，对加工精度产生重大的影响。硫醇-烯类材料具有固化凝胶点滞后的特点，使固 化过程产生的应力很快得到弛豫，因而收缩产生的影响小。本文将多种硫醇-烯类材料应用 于基于紫外压印的连续浮雕结构微光学元件复制加工工艺中，用以降低固化收缩对于加工误 差的影响。实验结果表明，虽然该材料的固化收缩达到 13%，但加工结果的收缩误差优于 2%。反应离子刻蚀实验表明，通过调节刻蚀气体含量，该材料可实现连续浮雕结构的等比 例图形传递。综上，应用基于硫醇-烯材料的紫外压印工艺制作连续浮雕结构微光学元件是 一种行之有效的方法。 关键词：微光学；紫外压印；硫醇-烯；固化收缩；反应离子刻蚀 中图分类号： TH162+.1 Low Shrinkage Effect Fabrication Process of Micro Optical Elements Based on UV-embossing with Thiol-ene Resist Liu Nan, Jin Peng, Tan Jiubin (School of Electrical Engineering and Automation, Harbin Institute of Technology, Harbin 150001) Abstract: It is a proper method with the advantage of low cost, high efficiency, high resolution which fabricates micro optical elements on fused silica substrates with UV-embossing and reactive ion etching. The curing shrinkage is one of the most important problems in UV-embossing, which can bring much fabrication error. Thiol-ene polymer has such an advantage as delayed gel point, so the shrinkage stress caused by curing can be relaxed easily, and the shrinkage error can be brought down. In this paper, we propose a method which fabricates micro optical elements with continuous relief through UV-embossing process based on thiol-ene resist, in order to reduce the influence of curing shrinkage. It can be seen from the experiment results that, the curing shrinkage of this material is about 13%, but the fabrication error can be bring down to less than 2%. And reactive ion etching experiment results show that, the continuous relief can be transferred into fused silica substrates with the equal etching rate, through the Reactive Ion Etching based on adjusting the parameters of the etching gas. So that, it can be seen that, it is a proper method which fabricates micro optical elements with continuous relief through UV-embossing with thiol-ene resist. Key words: Micro