期刊Electron beam process validation for sterilization of complex geometries.pdfVIP

Radiation Physics and Chemistry 63 (2002) 581–586 Electron beam process validation for sterilization o fcomplex geometries a b b, Douglas E. Weiss , Denise A. Cleghorn , Sam V. Nablo * a 3M Corporate Research, St. Paul, MN 55144, USA b Electron Processing Systems, Inc., Executive Park Drive, N. Billerica, MA 01862, USA Abstract The application o flow-energy electrons for the disinfection o fcontainers o fcomplex geometries has been limited due to their inability to efficiently penetrate the rigid walls. Most three-dimensional applications have been evaluated using higher energy processors with bulk or through-the-wall treatment. This work has been directed to the validation o electron disinfection o finterior surfaces by injecting electrons through the open-mouth o fthe container. Both direct thin-film dosimetric mapping o fthe interior and exterior dose distributions for in-line treatment have been conducted and compared with the results o fMonte Carlo modeling utilizing 106 or more source electron histories. Sterilizer characterization and model assumptions are described and the advantages o fthe modeling technique for process parameter optimization discussed. r 2002 Elsevier Science Ltd. All rights reserved. Keywords: Electron sterilization; Dosimetry mapping; Monte Carlo modeling; Dosimetry model correlation 1. Introduction encountered. This work has been dir