Modeling and fabrication of a microelectromechanical microwave switch》.pdfVIP

ARTICLE IN PRESS Microelectronics Journal 38 (2007) 519–524 /locate/mejo Modeling and fabrication of a microelectromechanical microwave switch a, b b Ching-Liang Dai , Heng-Ming Hsu , Ming-Chang Tsai , Ming-Ming Hsiehb, Ming-Wei Changc aDepartment of Mechanical Engineering, National Chung Hsing University, Taichung 402, Taiwan, ROC bDepartment of Electrical Engineering, National Chung Hsing University, Taichung 402, Taiwan, ROC c Center for RFID Technology, Industrial Technology Research Institute, Hsinchu 310, Taiwan, ROC Received 2 January 2007; accepted 3 March 2007 Available online 20 April 2007 Abstract A microelectromechanical microwave switch manufactured by using a complementary metal oxide semiconductor (CMOS) post- process has been implemented. An equivalent circuit model is proposed to analyze the performance of the microwave switch. The components of the microwave switch consist of a coplanar waveguide (CPW), a suspended membrane and supported springs. The post- process requires only one wet etching to etch the sacrificial layer, and to release the suspended structures. Experimental results show that the switch has an insertion loss of 2 dB at 50 GHz and an isolation of 15 dB at 50 GHz. The driving voltage of the switch