环境因素及控制方法分析——以集成电路工厂光刻区为例word格式论文.docx

优秀毕业论文 精品参考文献资料 环境因素及控制方法研究 ——以集成电路生产线光刻区为例 摘 要 集成电路产业是我国重点发展的新兴战略产业，国家集成电路十 二五规划中明确了集成电路是国家战略性新兴产业，，集成电路制造业 是集成电路产业中极其重要的一环。 集成电路制造是一个非常复杂的流程，其中光刻是其中最重要的 环节。由于光刻设备的精密性要求以及光刻材料的敏感性，环境因素 会对其产生非常大的影响从而影响产品质量，尤其是微振动、颗粒污 染和气态分子污染属于环境工程学需要研究的对象。 本文尝试从光刻设备的原理出发，结合国内外资料及自身工作实 践经验，论述上述环境因素对生产造成的影响，分析各类对光刻区生 产造成影响的环境污染因子的来源以及相关控制标准的对比，进而介 绍其控制原理及控制方法，包括各类设备及其应用方案，然后以层次 分析（AHP）和趋势图分析的方法来对实际案例进行分析。 光刻区域的环境因素很多，需综合考虑并有针对性地采取措施。 本研究较完整地分析了集成电路生产线光刻区域的环境因素控制方 法，推导了在微振动、颗粒污染和气态分子污染方面有效的处理流程 并总结了相关经验。 关键词：集成电路，光刻，微振动，颗粒污染，洁净度，气态分 子污染物 II ENVIRONMENTAL FACTORS AND CONTROL METHODS --A CASE STUDY OF LITHOGRAPHY AREA IN IC FAB ABSTRACT The IC(Integrated Circuit) industry is a strategic industry, the 12nd Five-Year National Plan of IC indicated the importance of IC industry, and the manufacturing of IC is an extremely important part of the IC industry.IC Manufacturing is a very complex process and lithography is the most important part. Because of the sensitivity of precision of lithography equipments and chemical materials used in the process, environmental factors will have great impact to product quality, especially micro-vibration, particle pollution and AMC(Airborne Molecular Contamination),they are the objects of study in environmental engineering . This paper attempts to departure from the principle of lithography equipment, combined with domestic and foreign information and practical working experience, discusses the impact of these environmental factors, and analyzes the source of various environmental factors as well as relevant standards. Then describe the environmental equipments and their use in the process. After that, using AHP (Analytic Hierarchy Process) and trend analysis method analyze several actual cases. Because of the complexity of the environmental factors in lithography area, every process should be comprehensive and integrated. In this study, a more complete analysis of the IC FAB lithography area environmental factors control methods has been made, setup eff