Nb纳米金属多层膜延性及断裂行为的尺寸效应.pdfVIP

47 2 Vol.47 No.2 2011 2 246—250 ACTA METALLURGICA SINICA Feb. 2011 pp.246–250 Cu/Nb ∗ (, 710049) Æ (λ=10—250 nm) Cu/Nb . , Cu/Nb , . , , , 50 nm . , Nb Cu . . , , , TG113 A 0412−1961(2011)02−0246−05 LENGTH SCALE DEPENDENT DUCTILITY AND FRAC- TURE BEHAVIOR OF Cu/Nb NANOSTRUCTURED METALLIC MULTILAYERS ZHANG Xin, ZHANG Jinyu, LIU Gang, ZHANG Guojun, SUN Jun State Key Laboratory for Mechanical Behavior of Materials, Xi’an Jiaotong University, Xi’an 710049 Correspondent: SUN Jun, professor, Tel: (029 E-mail: junsun@mail.xjtu.edu.cn Supported by National Basic Research Program of China (No.2010CB631003) and National Natural Science Foundation of China (No Manuscript received 2010–08–13, in revised form 2010–10–26 ABSTRACT By using uniaxial tensile test combining the in situ electrical resistance change method, the influence of modulation period with a wide range spanning from 10 to 250 nm on the ductility and fracture toughness of Cu/Nb nanostructured metallic multilayers on polyimide substrate was measured. The microstructural analysis revealed that the modulation structure of Cu/Nb metallic multilayers was clear and no intermixing between Cu and Nb was been found by using line scanning analysis. The experimental results indicated that both ductility and fracture toughness of the multilayer film exhibited a nonmonotonic change with decreasing modulation period, and reached maximum values at a critical modulation period of about 50 nm. This was