Booklet_Introduction_to_HiTUS_Technology_of_Plasma_Quest__PQL__vs.Magnetron_sputtering__vacuum_coating_thin film_ surface activation_ etching_ cleaning精品.pdfVIP
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Booklet_Introduction_to_HiTUS_Technology_of_Plasma_Quest__PQL__vs.Magnetron_sputtering__vacuum_coating_thin film_ surface activation_ etching_ cleaning精品
INTRODUCTION TO
INTRODUCTION TO
*
*
HITUS TECHNOLOGY
I TECHNOLOGY
H TUS
OF PLASMA QUEST LIMITED
OF PLASMA QUEST LIMITED
* (HiTUS = High Target Utilisation Sputtering )
* (HiTUS = High Target Utilisation Sputtering )
This document has been prepared for the attention of personnel untrained in the sputtering technology with the purpose of
introducing to them the HiTUS* technology of Plasma Quest Limited (PQL). The information given here is, as a
consequence, insufficient to solve real problems. This document enables an outline understanding of the operation and the
significance of this new technology. As a consequence, it is well understood that neither Plasma Quest Limited nor its
employees, agents or any person capable of being implicated directly or indirectly in the present communication would be
expected to have some committed responsibility for the inaccuracy or incompleteness of information, systems, products or
processes revealed by any manner whatsoever. Similarly, particuliar attention has been brought forward as to not breach any
rights of third parties, products, processes, brands, manufacturers or services of any nature whatsoever. However, despite our
efforts, if there was any known problem, this could only be an error. In this case, we thank you for informing
contact@ without delay so that we could put a stop to this state of affairs as soon as possible. Should an
error occur, Plasma Quest Limited, its employees, agents or any person capable of being implicated directly or indirectly in
the present communication would be expected to have some committed responsibility for any cause whatsoever. In addition,
the viewpoints expressed by
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