《化工设备机械基础》课程教学大纲（Syllabus of the course of Fundamentals of chemical equipment and machinery）.docVIP

《化工设备机械基础》课程教学大纲（Syllabus of the course of Fundamentals of chemical equipment and machinery） Chemical equipment, machinery foundation course syllabus.Txt mens commitment, like 80 year old old ladys teeth, very few really. When you smoke, only three kinds of people will be happy, doctor, your enemy and cigarette seller. This article is contributed by cdled006 DOC documents may experience poor browsing on the WAP side. It is recommended that you first select TXT, or download the source file to the local view. Chemical equipment, machinery foundation, chemical equipment, mechanical foundation course, teaching program, chemical equipment, mechanical foundation Course Name: chemical equipment, mechanical foundation course type: (specialized basic courses) total hours: 45 Credits: 2.5 lectures, class hours: 45 Applicable subjects: biological engineering and chemical engineering: courses of descriptive geometry and mechanical drawing First, the nature, purpose and tasks of the course This course is a course of mechanical engineering for bioengineering, chemical engineering and so on. It belongs to the technical basic course. The task is to enable students to acquire the necessary knowledge of the design and use of the necessary chemical equipment. The main contents of this course: basic knowledge of engineering mechanics; basic knowledge of materials commonly used in chemical equipment; chemical containers (especially thin container) mechanical knowledge and equipment; basic knowledge of mechanical transmission; design principle of internal and external pressure vessel, the general method of middle and low pressure container design, parts selection bearing, flange, manhole and standard parts. At the same time in the teaching activities, the gradual deepening of the engineering consciousness of students, try to shorten between engineering application and classroom learning gap; clear understanding of their professional status and function in the whole chemical device, thus