化学镀原料(Electroless plating material).docVIP

化学镀原料(Electroless plating material).doc

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化学镀原料(Electroless plating material)

化学镀原料(Electroless plating material) 1.NiMn two element alloy coating Ni Mn matrix hardness Rockwell hardness than nickel cobalt (HRC) 10 degrees, Ni Mn matrix of diamond drilling bits in hard abrasive formation is strong, the average life expectancy and aging were higher than the nickel cobalt matrix bit increased by 55% and 30%, but two yuan NiMn alloy coating has high brittleness and easy to crack, so that the working layer easy to break. 2.NiCoMn three element alloy coating NiCoMn three element alloy coating has higher comprehensive mechanical properties. The hardness is higher than NiCo, and the brittleness is lower than that of NiMn. It is in line with the requirement of electroplated diamond products to the matrix. The stone tool made of NiCoMn three alloy alloy coating is more sharp and durable than NiCo two yuan alloy coating, especially for hard stone. Due to saving a lot of expensive materials, cobalt, NiCoMn three alloy coating is of low cost. The mechanical properties of NiCoMn three element alloy deposits can be adjusted in a wide range to meet the needs of a wider range of occasions. However, when NiCoMn three alloy coating is obtained, the composition of the plating bath is complex and the stability is not easy to control. 3. refining additives Additive electrolyte, due to its adsorption on the electrode surface. The electrochemical polarization increased, the grain was covered to stop the growth of generating new nuclei; the new grain was soon covered, then produce new tuberculosis center, so to obtain fine crystallization. Secondly, the adsorption of the additive on the crystal surface can reduce the surface energy of the crystal, and thus can reduce the formation of microcrystalline, which is beneficial to form new crystalline nuclei. Refining additives are mainly sulfonic acid, sulfonic acid, sulfonamide, two sulfonic acid, such as: saccharin, toluene sulfonamide, benzene sulfonic acid, benzene sulfonic acid, naphthalene and sodium sulfonate and s

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