P01 Basic photo filtration Dispense - 鼎岳科技股份有限公司.pptVIP

The Basic Concept of the Photo filtration/Dispense Content The concept of liquid filtration What is an ideal dispense operation? Two-stage vs. single-stage Oring Conclusion The key to filter in photo The Filter pore size / Retention How much ? 0.1um, 0.2um… Lower filtration rate, Higher retention The Chemical Compatibility / Pre-wetting PTFE UPE PP Nylon Cleanness Low Hold Volume Retention Mechanisms: Hydrophobic Vs Hydrophilic Hydrophobic Vs Hydrophilic Key for Photo resist filtration / Dispense Consistent performance Microbubble free dispense Minimize Photoresist consumption Maximize OEE (Overall Equipment Efficiency) Minimize downtime Reduce time to steady-state process Improved equipment reliability (Utilization) General Problem with Coating Process Contamination, High defects density Soft particles Hard particles Bad Coating / Spin, poor uniformity, thickness drifted Poor suckback Insufficient photo-chemical Inconsistent dispense rate Operator error, using the wrong recipe Back splash / Other hardware issues Miss coating / High rework rate Photoresist Coating Defects Pure Performance Consistent Reduction in Particles Two stage design allows for a slower filtration rate Low filtration allows for lower filtration pressures More efficient removal of gel slugs and hard particles Filtration rate is independent of dispense rate Outstanding retention of gels, particle-on-wafer performance. filter changeout in less than 1 minute 如何選擇O-RING 物理 / 機械性質 --- 用途 熱性質 --- 操作環境溫度 物質抵抗 --- 操作環境接觸物質 O-ring的選擇及應用基本指南 可得之優點----- 1.極佳的可靠性 2.較長之使用壽命 3.更高的安全性與可靠性 4.標準化與減少現貨存量的契機 5.最佳化之密封解決之道 結論 UPE filter is the optimal choice No need pre-wetting Better retention Limited Micro-bubble issue Two-stage technology pumps show far superior performance than conventional one-stage pumps. No need to adjust pump - Repeatable, reliable dispense Easy changeout guarantees fewer mistakes COST Saving 選擇 O-ring 的重點 用途 溫度 接觸物質 * * * 主講人 : 龍仁生 鼎岳科技公司 技術研討 Capture by Size