电镀废水处理站DTCR辅助氢氧化物沉淀工艺改造.pdfVIP

DTCR 王本洋 简 丽 ( , 100120) 某废水处理站改造前采用传统氢氧化物沉淀工艺处理高浓度含铬氰镉电镀废水, 运 不稳定, 出水不能达标排放工艺改造后增加了高分子重金属捕集沉淀剂DT CR 辅助去除重金属, 在含铬废水DT CR 投加量为50 mg/ L含氰镉废水DT CR 投加量为 10 mg/ L 条件下, 出水总铬镉 分别稳定在 0. 5 mg/ L0. 2 mg/ L 以下, 远低于电镀污染物排放标准( GB 21900 2008) 限值 电镀废水 DT CR 沉淀 重金属 铬 氰镉 Improvement of the DTCRassistant hydroxide precipitation process in el ectroplati ng wastewater treatment station Wang Benyang, Jian Li (S econd Design and Research I nstitute, China A viation P lanning and Construction Dev elop ment Co. , L td. , B eij ing 1 12 , China) Abstract: Before recon tr uction project , om e w a tew ater treatment tation u ed the tr adition- al hydroxide precipitation proce to treat electroplating w a tew ater w hich co ntaining high co ncen- tration chro mium and cadm ium cy anide, but the treatment eff ect w a not table and effluent could not meet the di charg e tandard . After improvement, the polym er heavy m etal chelating agent DT CR w a u ed to help heavy m etal remov al. When the DT CR do ag e for chromium w a tew ater and cadmium cy anide w a tew ater w ere 50 mg/ L and 10 m g/ L re pectiv ely , the total chro mium , cadm ium in effluent w ere tabilized below 0. 5 mg/ L and 0. 2 m g/ L r e pectively, w hich w a far be- low the tandard of E mission standard of p ollutants f or electrop lating ( GB 2 1900 2008) . Keywords: E lectr oplating w a tew ater; DT CR; Precipitation; H eavy m etal; Chrom ium; Cad- m ium cy anide , 8 h, 3 400 m / d 2001 , 1 ( GB 8978 1996) 1