毕业论文：《氮气分压对薄膜形成的影响》.docVIP

PAGE 氮气分压对薄膜形成的影响 摘 要 表面工程作为一门新兴的综合性学科，近年来，在国内外得到了迅速的发展。实践证明，表面工程的运用能有效改善材料的表面性能，提高生产力，节约资源。 本论文主要介绍了磁控溅射的基本原理，并采用磁控溅射法在不同的氮分压下制备了一系列CrNx薄膜，还利用EDS和XRD检测了薄膜的成分和相组成，采用力学探针测量了薄膜的硬度和弹性模量。分析了氮分压对薄膜成分、相组成和力学性能的影响。通过大量的试验和分析，总结得到CrN薄膜性能的影响因素。并用x射线衍射技术(XRD)、扫描电子显微镜(SEM) 等技术分析了薄膜的相结构、表面形貌。本文还探讨了CrN薄膜的显微硬度和Cr含量之间的关系及其微观机制。显微硬度测试表明：薄膜具有很高的硬度。利用XRD结构分析表明，已经制备出的CrNx薄膜，结构相中含有CrN、Cr2N和Cr。 关键词：磁控溅射，CrNx薄膜，氮分压，力学性能 NITROGEN PRESSURE OF FILM FORMATION ABSTRACT Surface engineering,as a newly synthesis subject,has been progressed rapidly inrecent years．It was proved that the application of surface engineering can excellentlyimprove surface property of materi．al,which can improve productibility and saveresources．Experts predict that surface engineering will become one of the mostpredominant techniques in the future of 21 century． This paper mainly introduces the basic principle of magnetron sputtering，CrNx thin films were deposited with reactive magnetron sputtering method.EDX and XRD were employed to characterize their compositon and phases.Their microhardness and elastic modulus were evaluated using a microhardness tester and the effect of partial pressure on the composition ,phase formation and mechnical properties of thin films was investigated. The results show that The relationship among hardness, Cr concentration of coatings and their mechanism are discussed.Microhardness measurements show that the hardness of coatings is high.The structural analysis of the film by X-ray diffraction(XRD)method shows that CrN coatings has been prepared include CrN,Cr2N and Cr phases． Key words: magnetron sputtering; films; partial pressure;mechanical properties 目 录 TOC \o 1-3 \h \z \u 前 言 h 1 第一章 绪论 h 2 §1.1 背景 h 2 §1.2 表面工程技术工艺技术的近代发展 h 4 §1.2.1 激光束引发了新进展 h 4 §1.2.2 电子束导致了新进步 h 4 §1.2.3 离子束取得的新成就 h 4 §1.2.4 三束强化气相沉积技术 h 4 第二章 薄膜技术 h 5 §2.1 薄膜技术 h 5 §2.1.1 薄膜生长机理 h 6 §2.1.2 临界核的形成 h 6 §2.1.3 岛的成核和长大 h 6 §2.2 磁控溅射镀膜法 h 7 §2.2.1 基本原理 h 8 §2.