镍铬合金薄膜之退火热处理制程等溅镀参数研究摘要ONTHE.PDFVIP

鎳鉻合金薄膜之退火熱處理製程等濺鍍參數研究 賴儀聰 * 樊丕緒* 熊樂群 **吳炎全 * 張達 * 國立台北科技大學* 機電科技研究所博士班 **國防大學中正理工學院 機械工程系 摘要 本研究以探討鎳鉻合金薄膜濺鍍沈積於玻璃基板的製程為基礎，研究切入的角度著重 於瞭解製程參數 （Processing ）－性質 （Properties ）之間的關係 ，並加以掌握控制。實驗內 容包括直流磁控濺射系統的退火熱處理 （真空、氧氣氛 ）、靶基間距及基板公轉速率等製 程參數 。研究顯示 ，藉由靶基間距與退火處理等製程掌控 ，可改善薄膜的品質與附著性 ， 進而達到電雷管之可靠性 、安全性要求，並在通過43,000 ｇ之衝擊測試後 ，其發火正常、 點火作用時間最短可達 120 μs 。 關鍵字 : 鎳鉻合金薄膜 、退火 、電雷管 、濺鍍 ON THE SPUTTERING PROCESS OF NICR ALLOY FILM I. T. Lai*, P. S. Fan*, L. C. Hsiung ** , Y. C. Wu* and Ta Chang* *Graduate Institute of Mechanical and Electrical Engineering-Ph.D Program ,National Taipei University of Technology **Department of Mechanical Engineering, Chung Cheng Institute of Technology, National Defense University ABSTRACT This thesis is to investigate the manufacture of the thin metal film bridge detonators using the sputtering techniques and to characterize their properties and performance. Metal films (80Ni-20Cr, by weight percent) were deposited in the vacuum chamber with a D.C. magnetron cathode sputtering. All important structure- and property-sensitive parameters during the sputtering processes are discussed. They include annealing , the distance between target and substrate, rotation rates of substrates, and deposition rate, roughness, adhesion, residual stress ,and sheet resistance of films. The films were characterized and analyzed using glancing incident angle X-Ray diffraction (GIAXRD), optical-, scanning-,and atomic force microscopy (AFM). Keywords: NiCr alloy film, Annealing, Electro-detonator, Sputtering 片 （Slide glass ）上 ，進而探討其理想之製 1.前言