25mw太阳能设备配置(25MW solar device configuration).docVIP

25mw太阳能设备配置(25MW solar device configuration).doc

  1. 1、有哪些信誉好的足球投注网站(book118)网站文档一经付费(服务费),不意味着购买了该文档的版权,仅供个人/单位学习、研究之用,不得用于商业用途,未经授权,严禁复制、发行、汇编、翻译或者网络传播等,侵权必究。。
  2. 2、本站所有内容均由合作方或网友上传,本站不对文档的完整性、权威性及其观点立场正确性做任何保证或承诺!文档内容仅供研究参考,付费前请自行鉴别。如您付费,意味着您自己接受本站规则且自行承担风险,本站不退款、不进行额外附加服务;查看《如何避免下载的几个坑》。如果您已付费下载过本站文档,您可以点击 这里二次下载
  3. 3、如文档侵犯商业秘密、侵犯著作权、侵犯人身权等,请点击“版权申诉”(推荐),也可以打举报电话:400-050-0827(电话支持时间:9:00-18:30)。
  4. 4、该文档为VIP文档,如果想要下载,成为VIP会员后,下载免费。
  5. 5、成为VIP后,下载本文档将扣除1次下载权益。下载后,不支持退款、换文档。如有疑问请联系我们
  6. 6、成为VIP后,您将拥有八大权益,权益包括:VIP文档下载权益、阅读免打扰、文档格式转换、高级专利检索、专属身份标志、高级客服、多端互通、版权登记。
  7. 7、VIP文档为合作方或网友上传,每下载1次, 网站将根据用户上传文档的质量评分、类型等,对文档贡献者给予高额补贴、流量扶持。如果你也想贡献VIP文档。上传文档
查看更多
25mw太阳能设备配置(25MW solar device configuration) This article is contributed by bjl1288 DOC documents may experience poor browsing on the WAP side. It is recommended that you first select TXT, or download the source file to the local view. 25MW solar production line equipment configuration table In the energy shortage and environmental problems under the double pressure, the world has set off a boom of development and utilization of solar energy and renewable energy, solar energy is the inexhaustible renewable energy, and clean energy, in line with Chinas industrial policy to encourage. The 25MW solar production line equipment configuration is introduced as follows: first, production capacity of 156 * 156mm chip, each piece of power is about 2.5W, to work 16 hours a day yield is about 1800/ / h, so the annual output of 25MW. Two, the number of process equipment and configuration 1, all domestic procurement (10 million yuan) The production efficiency of the process system of cashmere wafer cleaning machine equipment list of 1800 pieces per hour for allocation of the number of manufacturers can handle 1. wafer size: 145 x Max156mm 156mm 2.3 mechanical arms, 11 tank 1. can handle wafer diameter: Max156mm * 156mm dry dryer 150 / min 245 rotation speed of 100 - 2. 3. 900min 0.003 m 4. nitrogen nitrogen filtering drying 1. thermal cavity size: suitable for 2 ~ 8 wafer 2. constant temperature accuracy: less than 0.5 DEG C diffusion furnace 500 / 348 hours (800 to 1280 DEG C) 3. temperature zone stability is + 0.5 DEG /24h (800 DEG to 1280 DEG C 4.) thickness uniformity (a group): 5% 000 Changsha etching etching machine 1120 / 2 hour gold limited to PSG technology to phosphorus silicon glass 1800 / 45 hours The 1. can handle silicon wafer size: Max156m * 156mm 2. reaction chamber limit vacuum: 1Pa 3., automatic adjustment vacuum pressure product technical index, describe single unit price (10000 yuan) Total (10000 yuan) 1. silicon chip size: Max156mm * 156mm 2.1 mechanical ar

您可能关注的文档

文档评论(0)

f8r9t5c + 关注
实名认证
文档贡献者

该用户很懒,什么也没介绍

版权声明书
用户编号:8000054077000003

1亿VIP精品文档

相关文档