掺锆氧化镍硅化镍硅微通道结构的三维超级电容器.pdfVIP

Material Sciences 材料科学, 2012, 2, 77-82 doi:10.4236/ms.2012.22014 Published Online April 2012 (/journal/ms) Synthesis of Zr Doped NiO Layers on NiSi /Si-MCP Structures 2 for Supercapacitors Linling Gu, Tao Liu, Jia Lai, Mai Li, Fei Wang, Shaohui Xu, Lianwei Wang Key Laboratory of Polar Materials and Devices, Ministry of Education, and Department of Electronic Engineering, East China Normal University, Shanghai Email: shxu@ Received: Dec. 14th, 2011; revised: Dec. 29th, 2011; accepted: Jan. 7th, 2012 Abstract: Three-dimensional supercapacitors consisting of Zr doped NiO/NiSi2/silicon microchannel plate (MCP) stacked structures are fabricated. The silicon MCP fabricated by electrochemical etching is utilized as a substrate of 3D structure. After electroless plating of zirconium doped nickel on the surface of the Si-MCP substrate, the Zr doped NiO and NiSi2 are synthesized by annealing at 500˚C in oxygen condition. The structure and morphology of the Zr doped NiO/NiSi2/Si-MCP nanocomposite electrodes are characterized by scanning electron microscopy (SEM), energy-dispersive X-ray spectrometry (EDX) and X-ray diffraction (XRD). The electrochemical properties are determined by cyclic voltammetry (CV) and chronopotentiometry. The results show the improvement of capacity and good reversibility for Zr doped NiO/NiSi2/Si-MCP. Keywords: Zr Doped NiO; Electrochemical Properties; Silicon Microchannel Plate (MCP) 掺锆氧化镍/硅化镍/硅微通道结构的 三维超级电容器 顾林玲，刘 涛，赖 佳，李 劢，王 斐，徐少辉，王连卫 华东师范大学电子工程系，教育部极化材料和器件重点实验室，上海 Email: shxu@ 收稿日期：2011 年 12 月 14