Current status of optical maskless lithography推荐.pdf

J. Microlith., Microfab., Microsyst. 4(1), 011003 (Jan– Mar 2005) Current status of optical maskless lithography Hans Martinsson Abstract. We review the current status of optical maskless lithography Tor Sandstrom technology. The optical maskless systems presented in literature are Micronic Laser Systems AB either aimed for low-cost, large-feature, low-end production, or high-end P.O. Box 3141 performance directly competing with state of the art optical scanners. In ¨ 183 03 Taby, Sweden the latter case, optical maskless systems are based on piston or tilting E-mail: hans.martinsson@micronic.se micromirror spatial light modulators (SLMs). Similar performance can be achieved with both mirror types, but tilting mirrors offer lower manufac- Arno Bleeker turing complexity, the possibility of using larger mirrors, less complex ASML rasterizing algorithms, and lower demands on the data path. This indi- Box 324 cates that the tilting mirror arrangement might be more appealing for 5500 AH Veldhoven high-performance, high-capacity, economical optical maskless lithogra- The Netherlands phy. With the latest technology in SLM and rasterizing technology, an optical maskless tool can match regular mask-based scanners in all im- Jason D. Hintersteiner