Analysis of Ion Energy Distribution at the Substrate during a HPPMS (Cr,Al)N Process using Retarding Field Energy Analyzer and Energy Resolved Mass Spectrometer文档.pdf

    Analysis of Ion Energy Distribution at the Substrate during a HPPMS (Cr,Al)N Process using Retarding Field Energy Analyzer and Energy Resolved Mass Spectrometer K. Bobzin, T. Br¨ogelmann, R.H. Brugnara, S. Chromy PII: S0040-6090(15)00836-6 DOI: doi: 10.1016/j.tsf.2015.08.059 Reference: TSF 34610 To appear in: Thin Solid Films Received date: 18 March 2015 Revised date: 13 July 2015 Accepted date: 14 August 2015 Please cite this article as: K. Bobzin, T. Br¨ogelmann, R.H. Brugnara, S. Chromy, Analy- sis of Ion Energy Distribution at the Substrate during a HPPMS (Cr,Al)N Process using Retarding Field Energy Analyzer and Energy Resolved Mass Spectrometer, Thin Solid Films (2015), doi: 10.1016/j.tsf.2015.08.059 This is a PDF file of an unedited manuscript that has been accepted for publication. As a service to our customers we are providing this early version of the manuscript. The manuscript will undergo copyediting, typesetting, and review of the resulting proof before it is published in its final form. Please note that during the production process errors may be discovered which could affect the content, and all legal disclaimers that apply to the journal pertain. ACCEPTED MANUSCRIPT Analysis of Ion Energy Distribution at the Substrate during a HPPMS (Cr,Al)N Process using Retarding Field Energy Analyzer and Energy Resolved Mass Spectrometer K. Bobzin, T. Brögelmann, R. H. Brugnara, S. Chromy* T P I R Surface Engineering Institute (IOT), RWTH Aachen University, Kackertstr. 15, 52072 C Aachen, Germany S U