椭偏技术的原理及其在功能薄膜表征中的应用.pdfVIP

第20卷 压 电 与 声 光 Vo1．20No．3 1 9 98年6月 PIEZOELECTRICS＆ACOUSTOOPTICS June 1998 椭偏技术的原理及其在功能薄膜表征中的应用 乡 c=) f广，抽 随着计算机技术的不断发展．已有一百多年历史的椭偏技术的研究重点已从该技术本 中的应用j镬围和局限a研究表明·结台其他分析工具并建立精细的椭塌模型-曼童叁盟鱼垄堂堕苎 靴 肌 7 关键词 垒錾·堕塑茎芋，妻g，功能垒基墨丝2} 哩 77； 器／博 蔓鳅 Principles of Ellipsometry and Its Applications in the Sun Shunming Zhang Liang,ving Yao Xi (Eiec~malc Materials Re昵a h Laboratory·X an Jiaot~n8 Ugi~erslty，X 盯l，710~t9) Abstract Research emphasis of~he technique of ellipsometry has been transferred to its nOV- el applications in materials analysis from el Lipsometry itself which has a hlstroy of oveT 1O0 years· upon the continuously rapid development of computer technology．Applied range and limits are giv— en about ell[psometry in characterization of materials through introducing its principles·Combining with other analysis tools and establishing refined mode1．researchers have illustrated that variable angle spectroscopic ellipsometry(VASE)can be used to determine quantitatively thickness，optical constants and porosity of various funct~ona|metal oxide thjn films·VASE will p1ay an active mie in epitaxial thin films of functional metal oxide．such as growth control·property optimizatiOn and so on- Keywords VASE，ellipsometry．characterization，functional metal oxide thin films 用。 1 前言 简单而言，椭偏技术是一种测定入射光 椭偏技术的研究始于一百多年前[ 。计 被样品反射(或透射)后偏振状态变化的光学 算机(尤其是PC机)的出现，才使椭偏仪能 方法。它通过测量被测对象(样品)反射出的 够从复杂的材料结构中，快速、精确和方便地 光线的偏振状态的变化情况来研究被测物质 测量并分析椭偏参数。椭偏技术的重点已从