standard cmos fabrication of a sensitive fully depleted electrolyte-insulator-semiconductor field effect transistor for biosensor applications敏感的标准cmos工艺完全耗尽electrolyte-insulator-semiconductor场效应晶体管生物传感器的应用.pdfVIP
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standard cmos fabrication of a sensitive fully depleted electrolyte-insulator-semiconductor field effect transistor for biosensor applications敏感的标准cmos工艺完全耗尽electrolyte-insulator-semiconductor场效应晶体管生物传感器的应用
Sensors 2009, 9, 4366-4379; doi:10.3390/ OPEN ACCESS sensors ISSN 1424-8220 /journal/sensors Article Standard CMOS Fabrication of a Sensitive Fully Depleted Electrolyte-Insulator-Semiconductor Field Effect Transistor for Biosensor Applications Gil Shalev, Ariel Cohen, Amihood Doron, Andrew Machauf, Moran Horesh, Udi Virobnik, Daniela Ullien and Ilan Levy * Intel Research Israel, Intel Electronics, Jerusalem 91031, Israel; E-Mails: gil.shalev@ (G.S.); ariel.cohen@ (A.C.); amihood.doron@ (A.D.); andrew.machauf@ (A.M.); moran.horesh@ (M.H.); udi.virobnik@ (U.V.);daniela.ullien@ (D.U) * Author to whom correspondence should be addressed; E-Mail: ilan.levy@; Tel.: +972-2589-7063; Fax: +972-2589-6342 Received: 25 March 2009; in revised form: 20 May 2009 / Accepted: 25 May 2009 / Published: 4 June2009 Abstract: Microfabricated semiconductor devices are becoming increasingly relevant for detection of biological and chemical components. The integration of active biological materials together with sensitive transducers offers the possibility of generating highly sensitive, specific, selective and reliable biosensors. This paper presents the fabrication of a sensitive, fully depleted (FD), electrolyte-insulator-semiconductor field-effect transistor (EISFET) made with a silicon-on-insulator (SOI) wafer of a thin 10-30 nm active SOI layer. Initial results are presented for device operation in solutions and for bio-sensing. Here we rep
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