Hybrid AFMBased Nanolithogr aphy on Brittle （混合AFMBased Nanolithogr aphy脆性）.pdf

Hybrid AFM-Based Nanolithography on Brittle Material 1 2 Deug Woo LEE , Jeong Woo PARK 1Department of Nanosystem and Process Engineering, Pusan National University, 50, Cheonghak-ri, Miryang, 627-706, KOREA, dwoolee@pusan.ac.kr 2Corresponding Author, Department of Mechanical Design Engineering, Chosun University, 375, Seosuk-dong, Gwangju, 501-759, KOREA, jwoopark@chosun.ac.kr Introduction diamond tips. Then, the oxide layer on the silicon surface was removed by etching in 25 mass % Generally, several successful attempts for buffered hydrofluoric acid (BHF). The diamond nanofabrication have been made at using scanning layer was subsequently deposited on the silicon probe microscopy (SPM), electron beam (EB), and mold utilizing an HF-CVD process following a focused ion beam (FIB) lithography to fabricate diamond nucleation process using an ultrasonic nanoscale to microscale structures. Especially, the agitator with diamond powders. The diamond layer remarkable challenges related to the 2 or 3- was mechanically polished in order to divide the dimensional fabrication in micro- to nano-scale in diamond tips. A silicon mold with a diamond tip these days are the electrochemical machining was etched in a KOH solution in order to dissolve through localized anodic dissolution of a substrate the