如何制作具有预期刻蚀深度的光刻胶浮雕全息图.pdfVIP

DOI :10.14016/j.cnki .jgzz.1997.06.011 　《》1997 18 6 　　　　　　　LASER JOURNAL(Vol.18, No 6.1997)　　 39 钟丽云　吕晓旭　张文碧　熊秉衡　杨齐民　宫爱玲 (云南工业大学激光研究所, 昆明　650051) :, , , , , , 。 :, , How to make a photoresist reliefhologram with expection groove depth Zhong Liy un 　LǜXiaoxu　Zhang Wenbi　Xiong Bingheng 　Yang Qiming 　Gong Ailing (Laser Institute, Yunnan Polytechnic University, Kunming, Yunnan　650051) Abstract:The holographic information transfered from photoresist master to replica is the relief groove depth.Many properties of the replica are related to groove depth of master, so it is important to control the groove depth of photoresist master.In this paper, a novel method is adopted to o tain the value of the phase modulation y measuring diffraction light intensity of the photoresist master.Since there is a certain relationship etween groove depth and phase modulation, the groove depth can e o tained indirectly. Key words:reliefhologram, etching depth, phase modulation 。 1　引言 α , , α, , , , αα 。 , α。 , (), 2 　理论分析 ( —)。 2.1　、 , , , 。 , , 1997 4 22 40 　《》1997 18 6 　　　　　　　LASER JOURNAL(Vol.18, No 6.1997)　　 〔1〕 Δd(μm) Δd = T 〔r -Δrexp (-αE )〕 (1) 1 0 T , Δr r r , E 1 2 ,α0 。 αE 1 0 Δd = ΔrαET +r T (2) 0 1 H, Δd (x, y )=H -(r T+ΔrαET )(3) 2 0 1　 O (x )=O0