微透镜列阵成像光刻技术.PDF

第 卷第 期 年 月 39 3 红外与激光工程 2010 6 Vol.39 No.3 Infrared and Laser Engineering Jun.2010 微透镜列阵成像光刻技术 张为国，董小春，杜春雷 ( 中国科学院光电技术研究所，四川 成都 610209) 摘 要： 介绍了一种利用微透镜列阵投影成像光刻的周期微纳结构加工方法。 该方法采用商业打 印机在透明薄膜上打印的毫米至厘米尺寸图形为掩模，以光刻胶作为记录介质，以微透镜列阵为投影物 镜将掩模缩小数千倍成像在光刻胶上，曝光显影后便可制备出微米、亚微米特征尺寸的周期结构列阵。 基于该方法建立了微透镜列阵成像光刻系统， 并以制备800 nm 线宽、50 mm×50 mm 面积的图形列阵 为例，实现了目标图形的光刻成形，曝光时间仅为几十秒，图形边沿粗糙度低于100 nm。该方法系统结构 简单、掩模制备简易、曝光时间短；为周期微纳结构的低成本、高效率制备提供了有效途径。 关键词： 微纳光学； 成像光刻； 微透镜列阵； 微纳结构 中图分类号： O43 文献标识码： A 文章编号： 1007-2276(2010)03-0469-04 Microlens array imaging -based photolithography technique ZHANG Wei -guo, DONG Xiao -chun, DU Chun -lei (Insititute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China) Abstract: A periodic microstructure fabrication method by use of microlens array imaging photolitho - graphy was presented. In this method, macroscopic (mm -～cm - sized) transparent films were used as the masks, and photoresist was used as the recording medium. The mask image was projected onto the photoresist by use of the microlens array with thousandfold size shrinkage, and a periodic pattern with micro/sub -micrometer feature size could be formed after exposure. The microlens array imaging photolithography system based on this method was established, and an array pattern with 800 nm line width and an area of