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Defect Parameter Extraction in Backend Process Steps Using a Multilayer Checkerboard Test S
Copy of: Proc. IEEE 1995 Int. Conference on Microelectronic Test Structures, Vol.8, March 1995
Defect Parameter Extraction
in Backend Process Steps
Using a Multilayer Checkerboard Test Structure
Christopher Hess, Larg H. Weiland
Institute of Computer Design and Fault Tolerance (Prof. Dr. D. Schmid)
University of Karlsruhe, P. O. Box 6980, D-76128 Karlsruhe, Germany
Phone: +49-721-6084217, FAX: +49-721-370455, email: hess@informatik.uni-karlsruhe.de
Abstract To control defect appearance in numerous
conducting layers of backend process steps, a novel
multilayer checkerboard test structure (MCTS) is
presented. The Separation and localization of defects -
causing electrically detectable intralayer short circuits as
well as interlayer short circuits - will be achieved by
dividing the chip area into distinguishable small subchips
inside given standard boundary pads without using any
active semiconductor devices. The precise localization
facilitates a versatile optical defect parameter extraction.
1 INTRODUCTION
oday’s complexity of integrated circuits requires more and
Tmore conducting backend layers to connect all circuit cells
and devices. So, defects that cause typical backend faults inside
a layer (intralayer short) and also between adjacent layers
(interlayer shorts) gain more importance in defect statistics. For
that, especially designed test structures to control the backend
process steps for polysilicon and metal layers are in demand
that combine the following partly contrasting conditions:
? Large defect sensitive area to detect random defects even if
the defect density is low.
? Layer sensitive defect separation to assign electrically
detected defects to a specific layer.
? Precise defect localization to simplify optical defect
parameter extraction.
? No active semiconductor devices in test structures especially
to control backend process steps.
Generally basic geometrical layout objects like comb lines
and serpentine lines are used to investigate defect appeara
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