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1940 - Discovery of the p-n Junction
1940 - Discovery of the p-n Junction
Russell Ohl discovers the p-n junction and photovoltaic effects in
silicon that lead to the development of junction transistors and solar
cells.
Russell Ohl in his laboratory at Bell Laboratories
? 2006-2007 Alcatel-Lucent. All rights reserved
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In the mid-1930s Russell Ohl, an electrochemist at Bell Telephone
Labs in Holmdel, NJ, began investigating the use of silicon rectifiers as
radar detectors. He found that increasing the silicon purity helped
improve their detection ability. On 23 February 1940, he tested a
small silicon slab that yielded strange, surprising results. When
exposed to bright light, the current flowing through the slab jumped
appreciably. He also noticed that different parts of the crystal yielded
opposite electrical effects when tested with a cat’s whisker style
probe.
Ohl and colleague Jack Scaff found that a seam in the slab marked the
separation of the silicon into regions containing distinct kinds of
impurities. One impurity, the element phosphorus, yielded a slight
excess of electrons in the sample while the other, boron, led to a slight
deficiency (later recognized as holes). They called the
regions n-type (for negative) and p-type (positive); the surface or
barrier where these regions met became known as a p-n junction.
Light striking this junction stimulated electrons to flow from
the n-side to the p-side, resulting in an electric current. Ohl had
discovered the photovoltaic effect that powers today’s solar cells
(1954 Milestone).
William Shockley’s conception of the junction transistor in 1948 (1948
Milestone) derived from Ohl’s serendipitous 1940 discovery.
The p-n junction became the most common form of rectifier used in
the electronics industry and has since become a fundamental building
block in the design of semiconductor devices.
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Contemporary Documents
Ohl, R.S. Light-Sensitive Electric Device U. S. Patent
2402662 (Filed May 27,
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