2013_KLA.pptxVIP

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2013_KLA

Common Technological Projects - CERN IsraelWorkshop at the Weizmann Institute March 3, 2013Joel Seligson, KLA-Tencor (Israel) Corp.KLA-Tencor OverviewGlobal leader in yield acceleration since 1976 Installed base ~22,700 tools 5,800 employees ~ 3,870 technical personnel in 17 countries $1.5B RD investments over last 4 years FY 2012 Revenue $3.2 billionKLA-Tencor MarketsWaferReticleLEDMetrologyService/AppsKLA-Tencor (Israel) CorporationFounded in 1986450 employees in Migdal HaEmek other sitesDevelops and manufactures overlay metrology toolsA global manufacturing center for KLA-Tencor CorporationOverlay metrology - technological challengeMeasure lateral shifts to an accuracy of 1nm.Optical measurements:Imaging-basedDiffraction-basedShrinking dimensions ? Technology developmentTopics of interestHigh-resolution systemsOptical fieldsSimulationsLight sourcesDetectors sensorsNanometer-scale structuresHigh-resolution systemsStandard methods:Increase numerical apertureDecrease wavelengthNon-standard methodsBiological applications, e.g. STEDNear-field imagingOptical fieldsInterferenceSingular fieldsNear-field interactionsManipulation of complex amplitude, coherenceSimulationsCalculation of optical fields in complex geometriesEffects of sub-resolution featuresInverse problemsEfficiency of simulation algorithms (speed, memory)Light sourcesThermal vs. coherent sourcesLuminance (brightness)CoherenceBandwidthShort-wavelength sourcesPulsed sourcesDetectors sensorsDetector characteristics:Spatial ? Mpixels 2Mp = standardSpectral ? lvisible = standardTemporal ? frame rate 100Hz = standardWell depth (1/Noise) ? 20…30ke- = standardCost - Fix $1k…3k = standard Above have tradeoffsWe want no tradeoffs (“…and I want it now!”)Nanometer-scale structuresCreating novel optical properties using nanometer-scale structuresSimulating nano-structure/optics interactionsUpdated 10/2012

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