SEMI F78-2004 国外国际规范.pdf

SEMI F78-0304 PRACTICE FOR GAS TUNGSTEN ARC (GTA) WELDING OF FLUID DISTRIBUTION SYSTEMS IN SEMICONDUCTOR MANUFACTURING APPLICATIONS This practice was technically approved by the Global Gases Committee and is the direct responsibility of the North American Gases Committee. Current edition approved by the North American Regional Standards Committee on October 16, 2003. Initially available at February 2004; to be published March 2004. Originally published July 2003. 3.5 This practice applies only to welds performed with 1 Purpose no fillers and no fluxes. 1.1 The purpose of this practice is to provide 3.6 This practice does not apply to pressure vessel or procedures for welding stainless steels and other process chamber welds. corrosion resistant metals and alloys (CRAs) for fluid (liquid or gas) distribution systems in semiconductor 4 Referenced Standards manufacturing applications. Welds performed following these procedures are of sufficient quality to NOTE 1: The following documents become part of the provide the required system purity, weld integrity, and practice to the extent that they are included herein. weld strength for use in semiconductor manufacturing 4.1 SEMI Standards applications. SEMI F20 ó Specification for 316L Stainless